Mesoscopic and submicroscopic patterning in thin polymer films: Impact of the solvent

Edward Bormashenko; Roman Pogreb; Oleg Stanevsky; Yelena Bormashenko; Stein Tamir; Ron Cohen; Meirav Nunberg; Vladimir Zeev Gaisin; Maria Gorelik; O. V. Gendelman

doi:10.1016/j.matlet.2005.03.015

Mesoscopic and submicroscopic patterning in thin polymer films: Impact of the solvent

Edward Bormashenko
, Roman Pogreb
, Oleg Stanevsky
, Yelena Bormashenko
, Stein Tamir
, Ron Cohen
, Meirav Nunberg
, Vladimir Zeev Gaisin
, Maria Gorelik
, O. V. Gendelman

פרסום מחקרי: פרסום בכתב עת › מאמר › ביקורת עמיתים

55 ציטוטים ‏(Scopus)

תקציר

Formation of mesoscopic and submicrometric self-assembled patterns in polystyrene and polycarbonate films produced by a fast dip-coating process was studied. Mixtures of chloroform and dichloromethane were used as a solvent. The mixture's composition plays a decisive role in the patterning. Close-packed honeycomb structures comprised of 200-2000 nm pores dispersed in polymer matrix were obtained. The mechanism of self-assembling is discussed.

שפה מקורית	אנגלית
עמודים (מ-עד)	2461-2464
מספר עמודים	4
כתב עת	Materials Letters
כרך	59
מספר גיליון	19-20
מזהי עצם דיגיטלי (DOIs)	https://doi.org/10.1016/j.matlet.2005.03.015
סטטוס פרסום	פורסם - אוג׳ 2005

גישה למסמך

10.1016/j.matlet.2005.03.015

קבצים וקישורים אחרים

Link to publication in Scopus

פורמט ציטוט ביבליוגרפי

@article{b47affe4d1ef4f3dbefde96786b2b751,

title = "Mesoscopic and submicroscopic patterning in thin polymer films: Impact of the solvent",

abstract = "Formation of mesoscopic and submicrometric self-assembled patterns in polystyrene and polycarbonate films produced by a fast dip-coating process was studied. Mixtures of chloroform and dichloromethane were used as a solvent. The mixture's composition plays a decisive role in the patterning. Close-packed honeycomb structures comprised of 200-2000 nm pores dispersed in polymer matrix were obtained. The mechanism of self-assembling is discussed.",

keywords = "Mesoscopic, Microstructure, Polymers, Pores, Self-assembling, Solvent",

author = "Edward Bormashenko and Roman Pogreb and Oleg Stanevsky and Yelena Bormashenko and Stein Tamir and Ron Cohen and Meirav Nunberg and Gaisin, \{Vladimir Zeev\} and Maria Gorelik and Gendelman, \{O. V.\}",

note = "Funding Information: This work has been supported by the Israel Ministry of Absorption. The authors are grateful to Professor M. Zinigrad for his continuous support of our research activity. Oleg Gendelman is grateful to the Taub and Shalom Foundations for financial support. We thank Mrs. N. Litvak and Mr. Al. Shulzinger for SEM imaging of the samples.",

year = "2005",

month = aug,

doi = "10.1016/j.matlet.2005.03.015",

language = "אנגלית",

volume = "59",

pages = "2461--2464",

journal = "Materials Letters",

issn = "0167-577X",

publisher = "Elsevier B.V.",

number = "19-20",

}

TY - JOUR

T1 - Mesoscopic and submicroscopic patterning in thin polymer films

T2 - Impact of the solvent

AU - Bormashenko, Edward

AU - Pogreb, Roman

AU - Stanevsky, Oleg

AU - Bormashenko, Yelena

AU - Tamir, Stein

AU - Cohen, Ron

AU - Nunberg, Meirav

AU - Gaisin, Vladimir Zeev

AU - Gorelik, Maria

AU - Gendelman, O. V.

N1 - Funding Information: This work has been supported by the Israel Ministry of Absorption. The authors are grateful to Professor M. Zinigrad for his continuous support of our research activity. Oleg Gendelman is grateful to the Taub and Shalom Foundations for financial support. We thank Mrs. N. Litvak and Mr. Al. Shulzinger for SEM imaging of the samples.

PY - 2005/8

Y1 - 2005/8

N2 - Formation of mesoscopic and submicrometric self-assembled patterns in polystyrene and polycarbonate films produced by a fast dip-coating process was studied. Mixtures of chloroform and dichloromethane were used as a solvent. The mixture's composition plays a decisive role in the patterning. Close-packed honeycomb structures comprised of 200-2000 nm pores dispersed in polymer matrix were obtained. The mechanism of self-assembling is discussed.

AB - Formation of mesoscopic and submicrometric self-assembled patterns in polystyrene and polycarbonate films produced by a fast dip-coating process was studied. Mixtures of chloroform and dichloromethane were used as a solvent. The mixture's composition plays a decisive role in the patterning. Close-packed honeycomb structures comprised of 200-2000 nm pores dispersed in polymer matrix were obtained. The mechanism of self-assembling is discussed.

KW - Mesoscopic

KW - Microstructure

KW - Polymers

KW - Pores

KW - Self-assembling

KW - Solvent

UR - https://www.scopus.com/pages/publications/20444488121

U2 - 10.1016/j.matlet.2005.03.015

DO - 10.1016/j.matlet.2005.03.015

M3 - ???researchoutput.researchoutputtypes.contributiontojournal.article???

AN - SCOPUS:20444488121

SN - 0167-577X

VL - 59

SP - 2461

EP - 2464

JO - Materials Letters

JF - Materials Letters

IS - 19-20

ER -

Mesoscopic and submicroscopic patterning in thin polymer films: Impact of the solvent

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