Mechanism for reduced NBTI effect under pulsed bias stress conditions

B. Zhu; J. S. Suehle; J. B. Bernstein

doi:10.1109/RELPHY.2004.1315453

Mechanism for reduced NBTI effect under pulsed bias stress conditions

B. Zhu
, J. S. Suehle
, J. B. Bernstein

פרסום מחקרי: פרסום בכתב עת › מאמר מכנס › ביקורת עמיתים

5 ציטוטים ‏(Scopus)

תקציר

A series of experiments are conducted to study the physical mechanism of reduced NBTI effects observed under pulsed bias conditions. A reduction of V_th and I_on is observed for pulse periods shorter than critical time constants that are believed to be associated with hole trapping and detrapping processes. A two time constant model is developed to explain the reduction of V_th and I_on as a function of pulse repetition frequency.

שפה מקורית	אנגלית
מספר המאמר	1315453
עמודים (מ-עד)	689-690
מספר עמודים	2
כתב עת	IEEE International Reliability Physics Symposium Proceedings
כרך	2004-January
מספר גיליון	January
מזהי עצם דיגיטלי (DOIs)	https://doi.org/10.1109/RELPHY.2004.1315453
סטטוס פרסום	פורסם - 2004
פורסם באופן חיצוני	כן
אירוע	42nd Annual IEEE International Reliability Physics Symposium, IRPS 2004 - Phoenix, ארצות הברית משך הזמן: 25 אפר׳ 2004 → 29 אפר׳ 2004

גישה למסמך

10.1109/RELPHY.2004.1315453

קבצים וקישורים אחרים

Link to publication in Scopus

פורמט ציטוט ביבליוגרפי

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title = "Mechanism for reduced NBTI effect under pulsed bias stress conditions",

abstract = "A series of experiments are conducted to study the physical mechanism of reduced NBTI effects observed under pulsed bias conditions. A reduction of Vth and Ion is observed for pulse periods shorter than critical time constants that are believed to be associated with hole trapping and detrapping processes. A two time constant model is developed to explain the reduction of Vth and Ion as a function of pulse repetition frequency.",

author = "B. Zhu and Suehle, \{J. S.\} and Bernstein, \{J. B.\}",

note = "Publisher Copyright: {\textcopyright} 2004 IEEE.; 42nd Annual IEEE International Reliability Physics Symposium, IRPS 2004 ; Conference date: 25-04-2004 Through 29-04-2004",

year = "2004",

doi = "10.1109/RELPHY.2004.1315453",

language = "אנגלית",

volume = "2004-January",

pages = "689--690",

journal = "IEEE International Reliability Physics Symposium Proceedings",

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AU - Zhu, B.

AU - Suehle, J. S.

AU - Bernstein, J. B.

PY - 2004

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AB - A series of experiments are conducted to study the physical mechanism of reduced NBTI effects observed under pulsed bias conditions. A reduction of Vth and Ion is observed for pulse periods shorter than critical time constants that are believed to be associated with hole trapping and detrapping processes. A two time constant model is developed to explain the reduction of Vth and Ion as a function of pulse repetition frequency.

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AN - SCOPUS:84932111615

SN - 1541-7026

VL - 2004-January

SP - 689

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JO - IEEE International Reliability Physics Symposium Proceedings

JF - IEEE International Reliability Physics Symposium Proceedings

IS - January

M1 - 1315453

T2 - 42nd Annual IEEE International Reliability Physics Symposium, IRPS 2004

Y2 - 25 April 2004 through 29 April 2004

ER -

Mechanism for reduced NBTI effect under pulsed bias stress conditions

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