Investigation of conductive transparent in₂O₃thin films deposited by triode sputtering

Keyphrases

• Triode 100%
• Indium Oxide 66%
• Room Temperature 33%
• Low Pressure 33%
• Plasma Discharge 33%
• Optical Properties 33%
• Electrical Properties 33%
• Substrate Temperature 33%
• In2O3 Thin Film 33%
• Sputtering Method 33%
• Photovoltaic System 33%
• Electrode Surface 33%
• Magnetron Sputtering 33%
• Pure Argon 33%
• Glass Slide 33%
• Device Use 33%
• Heating Surface 33%
• Optical Technology 33%
• Electronic Technology 33%
• Transparent Thin Film 33%
• Optical Glass 33%

Engineering

• Conductive 100%
• Deposited Film 100%
• Thin Films 66%
• Magnetron 33%
• Room Temperature 33%
• Photovoltaic System 33%
• Optoelectronic Device 33%
• Electrode Surface 33%
• Substrate Temperature 33%
• Heating Surface 33%
• Optical Technology 33%
• Glass Slide 33%

Material Science

• Film 100%
• Thin Films 40%
• Oxide Compound 20%
• Indium 20%
• Magnetron Sputtering 20%
• Optical Property 20%
• Photovoltaics 20%
• Optical Glass 20%
• Surface (Surface Science) 20%