Investigation of conductive transparent in2O3thin films deposited by triode sputtering

A. Axelevitch, B. Gorenstein, A. Verdyan, G. Golan

פרסום מחקרי: תוצר מחקר מכנסהרצאהביקורת עמיתים

תקציר

Conductive transparent thin films play a significant role in the now-day electronics and optical technologies. Displays of various types, photovoltaic systems, and optoelectronic devices use these films as transparent signal electrodes or heating surfaces. In our work, conductive transparent indium oxide (In2O3) thin films were prepared using novel implementation of triode sputtering method. A pure In2O3 target of 2 inch in diameter was used to sputtering in a laboratory triode system provided with a plane plasma discharge at relatively low pressure (0.5-5 mTorr) of pure argon (Ar). The substrate temperature was varied during experiments from room temperature up to 200°C. The films were deposited on optical glass slides of 1 mm thick. The resultants films were characterized for their optical and electrical properties and compared with the In 2O3 films deposited by magnetron sputtering.

שפה מקוריתאנגלית
עמודים165-168
מספר עמודים4
סטטוס פרסוםפורסם - 2004
פורסם באופן חיצוניכן
אירוע2004 23rd IEEE Convention of Electrical and Electronics Engineers in Israel, Proceedings - Tel-Aviv, ישראל
משך הזמן: 6 ספט׳ 20047 ספט׳ 2004

כנס

כנס2004 23rd IEEE Convention of Electrical and Electronics Engineers in Israel, Proceedings
מדינה/אזורישראל
עירTel-Aviv
תקופה6/09/047/09/04

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