TY - JOUR
T1 - Wafer-Level Packaged CMOS-SOI-MEMS Thermal Sensor at Wide Pressure Range for IoT Applications †
AU - Avraham, Moshe
AU - Golan, Gady
AU - Vaiana, Michele
AU - Bruno, Giuseppe
AU - Castagna, Maria Eloisa
AU - Stolyarova, Sara
AU - Blank, Tanya
AU - Nemirovsky, Yael
N1 - Publisher Copyright:
© 2020 by the authors.
PY - 2020
Y1 - 2020
N2 - Wafer-level processed and wafer-level packaged low-cost microelectromechanical system (MEMS) thermal sensors are required for a wide range of Internet of Things (IoT) and wearables applications. Recently, a new generation of uncooled thermal sensors based on CMOS-SOI-MEMS technology has emerged, with higher performance compared to commercial thermal sensors (bolometers, thermopiles, and pyroelectric sensors). The technology is implemented in commercial CMOS FABs and is, therefore, based on mature technology and implemented at a low cost. When packaged in a high vacuum, the sensors are dubbed TMOS and are applied for uncooled IR radiation. At atmospheric pressure, the sensors may function as gas sensors, dubbed GMOS. This paper focuses on the study of the thermal performance of wafer-level processed and packaged TMOS and GMOS sensors, where the pressure varies between high vacuum (0.01 Pa) and atmospheric pressure. The present study is based on analytical thermal modeling for gaining physical insight, 3D simulation is performed by ANSYS software, and finally, the measurements of the packaged devices are compared with the modeling and simulations.
AB - Wafer-level processed and wafer-level packaged low-cost microelectromechanical system (MEMS) thermal sensors are required for a wide range of Internet of Things (IoT) and wearables applications. Recently, a new generation of uncooled thermal sensors based on CMOS-SOI-MEMS technology has emerged, with higher performance compared to commercial thermal sensors (bolometers, thermopiles, and pyroelectric sensors). The technology is implemented in commercial CMOS FABs and is, therefore, based on mature technology and implemented at a low cost. When packaged in a high vacuum, the sensors are dubbed TMOS and are applied for uncooled IR radiation. At atmospheric pressure, the sensors may function as gas sensors, dubbed GMOS. This paper focuses on the study of the thermal performance of wafer-level processed and packaged TMOS and GMOS sensors, where the pressure varies between high vacuum (0.01 Pa) and atmospheric pressure. The present study is based on analytical thermal modeling for gaining physical insight, 3D simulation is performed by ANSYS software, and finally, the measurements of the packaged devices are compared with the modeling and simulations.
KW - ANSYS
KW - CMOS-SOI-MEMS
KW - FEA simulations
KW - IoT
KW - TMOS
KW - thermal performance of radiation and gas sensors
KW - thermal uncooled IR sensors
KW - wafer-level packaging
KW - wearables
UR - http://www.scopus.com/inward/record.url?scp=85145362615&partnerID=8YFLogxK
U2 - 10.3390/ecsa-7-08191
DO - 10.3390/ecsa-7-08191
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AN - SCOPUS:85145362615
SN - 2673-4591
VL - 2
JO - Engineering Proceedings
JF - Engineering Proceedings
IS - 1
M1 - 30
ER -