Abstract
Self-assembly processes in intensively evaporated polymer solutions, based on chlorinated solvents and amorphous polymers, have been investigated under low and high humidity. Patterning on two scales, mesoscopic and microscopic, has been revealed. The strong dependence of the characteristic size of a mesoscopic pattern on the polymer solution concentration is revealed and studied. Various possible mechanisms of patterning on the two scales are discussed. It has been shown that the widespread hypothesis of micro-patterning induced with water droplets needs further justification. The influence of substrate defects on the mesoscopic patterning is also investigated.
| Original language | English |
|---|---|
| Pages (from-to) | 319-328 |
| Number of pages | 10 |
| Journal | Israel Journal of Chemistry |
| Volume | 47 |
| Issue number | 3-4 |
| DOIs | |
| State | Published - 2007 |
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