Self-assembly in evaporated polymer solutions: Patterning on two scales

Edward Bormashenko, Gene Whyman, Roman Pogreb, Oleg Stanevsky, Mordechai Hakham-Itzhaq, Oleg Gendelman

Research output: Contribution to journalArticlepeer-review

9 Scopus citations


Self-assembly processes in intensively evaporated polymer solutions, based on chlorinated solvents and amorphous polymers, have been investigated under low and high humidity. Patterning on two scales, mesoscopic and microscopic, has been revealed. The strong dependence of the characteristic size of a mesoscopic pattern on the polymer solution concentration is revealed and studied. Various possible mechanisms of patterning on the two scales are discussed. It has been shown that the widespread hypothesis of micro-patterning induced with water droplets needs further justification. The influence of substrate defects on the mesoscopic patterning is also investigated.

Original languageEnglish
Pages (from-to)319-328
Number of pages10
JournalIsrael Journal of Chemistry
Issue number3-4
StatePublished - 2007


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