TY - JOUR
T1 - Self-assembly in evaporated polymer solutions
T2 - Patterning on two scales
AU - Bormashenko, Edward
AU - Whyman, Gene
AU - Pogreb, Roman
AU - Stanevsky, Oleg
AU - Hakham-Itzhaq, Mordechai
AU - Gendelman, Oleg
PY - 2007
Y1 - 2007
N2 - Self-assembly processes in intensively evaporated polymer solutions, based on chlorinated solvents and amorphous polymers, have been investigated under low and high humidity. Patterning on two scales, mesoscopic and microscopic, has been revealed. The strong dependence of the characteristic size of a mesoscopic pattern on the polymer solution concentration is revealed and studied. Various possible mechanisms of patterning on the two scales are discussed. It has been shown that the widespread hypothesis of micro-patterning induced with water droplets needs further justification. The influence of substrate defects on the mesoscopic patterning is also investigated.
AB - Self-assembly processes in intensively evaporated polymer solutions, based on chlorinated solvents and amorphous polymers, have been investigated under low and high humidity. Patterning on two scales, mesoscopic and microscopic, has been revealed. The strong dependence of the characteristic size of a mesoscopic pattern on the polymer solution concentration is revealed and studied. Various possible mechanisms of patterning on the two scales are discussed. It has been shown that the widespread hypothesis of micro-patterning induced with water droplets needs further justification. The influence of substrate defects on the mesoscopic patterning is also investigated.
UR - http://www.scopus.com/inward/record.url?scp=51249085228&partnerID=8YFLogxK
U2 - 10.1560/IJC.47.3-4.319
DO - 10.1560/IJC.47.3-4.319
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AN - SCOPUS:51249085228
SN - 0021-2148
VL - 47
SP - 319
EP - 328
JO - Israel Journal of Chemistry
JF - Israel Journal of Chemistry
IS - 3-4
ER -