Patterning in rapidly evaporated polymer solutions: Formation of annular structures under evaporation of the poor solvent

Edward Bormashenko; Roman Pogreb; Albina Musin; Oleg Stanevsky; Yelena Bormashenko; Gene Whyman; Zahava Barkay

doi:10.1016/j.jcis.2006.03.064

Patterning in rapidly evaporated polymer solutions: Formation of annular structures under evaporation of the poor solvent

Edward Bormashenko, Roman Pogreb, Albina Musin, Oleg Stanevsky, Yelena Bormashenko, Gene Whyman, Zahava Barkay

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Abstract

Patterning in the intensively evaporated polymer solutions based on polystyrene and poor solvent (acetone) was investigated. SEM and AFM studies demonstrated that annular elements of the surface topography are formed in this case, in contrast to the honeycomb patterns obtained under the evaporation of the good solvent (chloroform). The authors suggest that the theory of viscous dewetting developed by de Gennes explains the phenomenon satisfactorily.

Original language	English
Pages (from-to)	293-297
Number of pages	5
Journal	Journal of Colloid and Interface Science
Volume	300
Issue number	1
DOIs	https://doi.org/10.1016/j.jcis.2006.03.064
State	Published - 1 Aug 2006

Keywords

Annular structures
Patterning
Polymer solutions
Poor solvent
Viscous dewetting

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10.1016/j.jcis.2006.03.064

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title = "Patterning in rapidly evaporated polymer solutions: Formation of annular structures under evaporation of the poor solvent",

abstract = "Patterning in the intensively evaporated polymer solutions based on polystyrene and poor solvent (acetone) was investigated. SEM and AFM studies demonstrated that annular elements of the surface topography are formed in this case, in contrast to the honeycomb patterns obtained under the evaporation of the good solvent (chloroform). The authors suggest that the theory of viscous dewetting developed by de Gennes explains the phenomenon satisfactorily.",

keywords = "Annular structures, Patterning, Polymer solutions, Poor solvent, Viscous dewetting",

author = "Edward Bormashenko and Roman Pogreb and Albina Musin and Oleg Stanevsky and Yelena Bormashenko and Gene Whyman and Zahava Barkay",

note = "Funding Information: The authors are grateful to Professor M. Zinigrad for his continuous support of our research activity. The authors are thankful to Professor A. Voronel and Mr. A. Sheshnev for fruitful discussions. The work has been supported by the Israel Ministry of Absorption.",

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T2 - Formation of annular structures under evaporation of the poor solvent

AU - Bormashenko, Edward

AU - Pogreb, Roman

AU - Musin, Albina

AU - Stanevsky, Oleg

AU - Bormashenko, Yelena

AU - Whyman, Gene

AU - Barkay, Zahava

N1 - Funding Information: The authors are grateful to Professor M. Zinigrad for his continuous support of our research activity. The authors are thankful to Professor A. Voronel and Mr. A. Sheshnev for fruitful discussions. The work has been supported by the Israel Ministry of Absorption.

PY - 2006/8/1

Y1 - 2006/8/1

N2 - Patterning in the intensively evaporated polymer solutions based on polystyrene and poor solvent (acetone) was investigated. SEM and AFM studies demonstrated that annular elements of the surface topography are formed in this case, in contrast to the honeycomb patterns obtained under the evaporation of the good solvent (chloroform). The authors suggest that the theory of viscous dewetting developed by de Gennes explains the phenomenon satisfactorily.

AB - Patterning in the intensively evaporated polymer solutions based on polystyrene and poor solvent (acetone) was investigated. SEM and AFM studies demonstrated that annular elements of the surface topography are formed in this case, in contrast to the honeycomb patterns obtained under the evaporation of the good solvent (chloroform). The authors suggest that the theory of viscous dewetting developed by de Gennes explains the phenomenon satisfactorily.

KW - Annular structures

KW - Patterning

KW - Polymer solutions

KW - Poor solvent

KW - Viscous dewetting

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Patterning in rapidly evaporated polymer solutions: Formation of annular structures under evaporation of the poor solvent

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