Novel type of indium oxide thin films sputtering for opto-electronic applications

G. Golan, A. Axelevitch, B. Gorenstein, A. Peled

Research output: Contribution to journalArticlepeer-review

39 Scopus citations

Abstract

Transparent conductive oxide (TCO) thin films play a significant role in recent optical technologies. Displays of various types, photovoltaic systems, and opto-electronic devices use these films as transparent signal electrodes. They are used as heating surfaces and active control layers. Oxides of TCO materials such as: tin, indium, zinc, cadmium, titanium and the like, exhibit their properties. However, indium oxide and indium oxide doped with tin (ITO) coatings are the most used in this technology. In this work, we present conductive transparent indium oxide thin films which were prepared using a novel triode sputtering method. A pure In 2 O 3 target of 2 in. in diameter was used in a laboratory triode sputtering system. This system provided plane plasma discharge at a relatively low pressure 0.5-5 mTorr of pure argon. The substrate temperature was varied during the experiments from room temperature up to 200 °C. The films were deposited on glass, silicon, and flexible polyimide substrates. The films were characterized for optical and electrical properties and compared with the indium oxide films deposited by magnetron sputtering.

Original languageEnglish
Pages (from-to)6608-6611
Number of pages4
JournalApplied Surface Science
Volume253
Issue number15
DOIs
StatePublished - 30 May 2007
Externally publishedYes

Keywords

  • Hot-probe evaluation
  • Indium oxide
  • Plane plasma sputtering

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