Mesoscopic patterning in thin polymer films formed under the fast dip-coating process

Edward Bormashenko; Roman Pogreb; Oleg Stanevsky; Yelena Bormashenko; Tamir Stein; Vladimir Zeev Gaisin; Ron Cohen; Oleg V. Gendelman

doi:10.1002/mame.200400217

Mesoscopic patterning in thin polymer films formed under the fast dip-coating process

Edward Bormashenko, Roman Pogreb, Oleg Stanevsky, Yelena Bormashenko, Tamir Stein, Vladimir Zeev Gaisin, Ron Cohen, Oleg V. Gendelman

Research output: Contribution to journal › Article › peer-review

60 Scopus citations

Abstract

Mesoscopically ordered self-assembled polystyrene, polycarbonate and poly(methyl methacrylate) films were obtained when polymer solutions were deposited on vertical plates and dried with hot air. It was shown that characteristic size (≈50 μm) of the mesoscopic cell is practically insensitive to the polymer or substrate kind, while the thickness of the substrate plays a decisive role in the mesoscopic patterning. Junction angles of 120 and 90° were observed. Marangoni instability plays an important role in the cell's structure formation. A semi-quantitative model explaining the phenomenon of mesoscopic cell formation is proposed.

Original language	English
Pages (from-to)	114-121
Number of pages	8
Journal	Macromolecular Materials and Engineering
Volume	290
Issue number	2
DOIs	https://doi.org/10.1002/mame.200400217
State	Published - 23 Feb 2005

Keywords

Dip-coating
Instability
Mesoscopic
Self-organization
Surfaces

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10.1002/mame.200400217

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title = "Mesoscopic patterning in thin polymer films formed under the fast dip-coating process",

abstract = "Mesoscopically ordered self-assembled polystyrene, polycarbonate and poly(methyl methacrylate) films were obtained when polymer solutions were deposited on vertical plates and dried with hot air. It was shown that characteristic size (≈50 μm) of the mesoscopic cell is practically insensitive to the polymer or substrate kind, while the thickness of the substrate plays a decisive role in the mesoscopic patterning. Junction angles of 120 and 90° were observed. Marangoni instability plays an important role in the cell's structure formation. A semi-quantitative model explaining the phenomenon of mesoscopic cell formation is proposed.",

keywords = "Dip-coating, Instability, Mesoscopic, Self-organization, Surfaces",

author = "Edward Bormashenko and Roman Pogreb and Oleg Stanevsky and Yelena Bormashenko and Tamir Stein and Gaisin, \{Vladimir Zeev\} and Ron Cohen and Gendelman, \{Oleg V.\}",

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T1 - Mesoscopic patterning in thin polymer films formed under the fast dip-coating process

AU - Bormashenko, Edward

AU - Pogreb, Roman

AU - Stanevsky, Oleg

AU - Bormashenko, Yelena

AU - Stein, Tamir

AU - Gaisin, Vladimir Zeev

AU - Cohen, Ron

AU - Gendelman, Oleg V.

PY - 2005/2/23

Y1 - 2005/2/23

N2 - Mesoscopically ordered self-assembled polystyrene, polycarbonate and poly(methyl methacrylate) films were obtained when polymer solutions were deposited on vertical plates and dried with hot air. It was shown that characteristic size (≈50 μm) of the mesoscopic cell is practically insensitive to the polymer or substrate kind, while the thickness of the substrate plays a decisive role in the mesoscopic patterning. Junction angles of 120 and 90° were observed. Marangoni instability plays an important role in the cell's structure formation. A semi-quantitative model explaining the phenomenon of mesoscopic cell formation is proposed.

AB - Mesoscopically ordered self-assembled polystyrene, polycarbonate and poly(methyl methacrylate) films were obtained when polymer solutions were deposited on vertical plates and dried with hot air. It was shown that characteristic size (≈50 μm) of the mesoscopic cell is practically insensitive to the polymer or substrate kind, while the thickness of the substrate plays a decisive role in the mesoscopic patterning. Junction angles of 120 and 90° were observed. Marangoni instability plays an important role in the cell's structure formation. A semi-quantitative model explaining the phenomenon of mesoscopic cell formation is proposed.

KW - Dip-coating

KW - Instability

KW - Mesoscopic

KW - Self-organization

KW - Surfaces

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EP - 121

JO - Macromolecular Materials and Engineering

JF - Macromolecular Materials and Engineering

IS - 2

ER -

Mesoscopic patterning in thin polymer films formed under the fast dip-coating process

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