Mesoscopic and submicroscopic patterning in thin polymer films: Impact of the solvent

Edward Bormashenko; Roman Pogreb; Oleg Stanevsky; Yelena Bormashenko; Stein Tamir; Ron Cohen; Meirav Nunberg; Vladimir Zeev Gaisin; Maria Gorelik; O. V. Gendelman

doi:10.1016/j.matlet.2005.03.015

Mesoscopic and submicroscopic patterning in thin polymer films: Impact of the solvent

Edward Bormashenko
, Roman Pogreb
, Oleg Stanevsky
, Yelena Bormashenko
, Stein Tamir
, Ron Cohen
, Meirav Nunberg
, Vladimir Zeev Gaisin
, Maria Gorelik
, O. V. Gendelman

Research output: Contribution to journal › Article › peer-review

55 Scopus citations

Abstract

Formation of mesoscopic and submicrometric self-assembled patterns in polystyrene and polycarbonate films produced by a fast dip-coating process was studied. Mixtures of chloroform and dichloromethane were used as a solvent. The mixture's composition plays a decisive role in the patterning. Close-packed honeycomb structures comprised of 200-2000 nm pores dispersed in polymer matrix were obtained. The mechanism of self-assembling is discussed.

Original language	English
Pages (from-to)	2461-2464
Number of pages	4
Journal	Materials Letters
Volume	59
Issue number	19-20
DOIs	https://doi.org/10.1016/j.matlet.2005.03.015
State	Published - Aug 2005

Keywords

Mesoscopic
Microstructure
Polymers
Pores
Self-assembling
Solvent

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10.1016/j.matlet.2005.03.015

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@article{b47affe4d1ef4f3dbefde96786b2b751,

title = "Mesoscopic and submicroscopic patterning in thin polymer films: Impact of the solvent",

abstract = "Formation of mesoscopic and submicrometric self-assembled patterns in polystyrene and polycarbonate films produced by a fast dip-coating process was studied. Mixtures of chloroform and dichloromethane were used as a solvent. The mixture's composition plays a decisive role in the patterning. Close-packed honeycomb structures comprised of 200-2000 nm pores dispersed in polymer matrix were obtained. The mechanism of self-assembling is discussed.",

keywords = "Mesoscopic, Microstructure, Polymers, Pores, Self-assembling, Solvent",

author = "Edward Bormashenko and Roman Pogreb and Oleg Stanevsky and Yelena Bormashenko and Stein Tamir and Ron Cohen and Meirav Nunberg and Gaisin, \{Vladimir Zeev\} and Maria Gorelik and Gendelman, \{O. V.\}",

note = "Funding Information: This work has been supported by the Israel Ministry of Absorption. The authors are grateful to Professor M. Zinigrad for his continuous support of our research activity. Oleg Gendelman is grateful to the Taub and Shalom Foundations for financial support. We thank Mrs. N. Litvak and Mr. Al. Shulzinger for SEM imaging of the samples.",

year = "2005",

month = aug,

doi = "10.1016/j.matlet.2005.03.015",

language = "אנגלית",

volume = "59",

pages = "2461--2464",

journal = "Materials Letters",

issn = "0167-577X",

publisher = "Elsevier B.V.",

number = "19-20",

}

TY - JOUR

T1 - Mesoscopic and submicroscopic patterning in thin polymer films

T2 - Impact of the solvent

AU - Bormashenko, Edward

AU - Pogreb, Roman

AU - Stanevsky, Oleg

AU - Bormashenko, Yelena

AU - Tamir, Stein

AU - Cohen, Ron

AU - Nunberg, Meirav

AU - Gaisin, Vladimir Zeev

AU - Gorelik, Maria

AU - Gendelman, O. V.

N1 - Funding Information: This work has been supported by the Israel Ministry of Absorption. The authors are grateful to Professor M. Zinigrad for his continuous support of our research activity. Oleg Gendelman is grateful to the Taub and Shalom Foundations for financial support. We thank Mrs. N. Litvak and Mr. Al. Shulzinger for SEM imaging of the samples.

PY - 2005/8

Y1 - 2005/8

N2 - Formation of mesoscopic and submicrometric self-assembled patterns in polystyrene and polycarbonate films produced by a fast dip-coating process was studied. Mixtures of chloroform and dichloromethane were used as a solvent. The mixture's composition plays a decisive role in the patterning. Close-packed honeycomb structures comprised of 200-2000 nm pores dispersed in polymer matrix were obtained. The mechanism of self-assembling is discussed.

AB - Formation of mesoscopic and submicrometric self-assembled patterns in polystyrene and polycarbonate films produced by a fast dip-coating process was studied. Mixtures of chloroform and dichloromethane were used as a solvent. The mixture's composition plays a decisive role in the patterning. Close-packed honeycomb structures comprised of 200-2000 nm pores dispersed in polymer matrix were obtained. The mechanism of self-assembling is discussed.

KW - Mesoscopic

KW - Microstructure

KW - Polymers

KW - Pores

KW - Self-assembling

KW - Solvent

UR - https://www.scopus.com/pages/publications/20444488121

U2 - 10.1016/j.matlet.2005.03.015

DO - 10.1016/j.matlet.2005.03.015

M3 - ???researchoutput.researchoutputtypes.contributiontojournal.article???

AN - SCOPUS:20444488121

SN - 0167-577X

VL - 59

SP - 2461

EP - 2464

JO - Materials Letters

JF - Materials Letters

IS - 19-20

ER -

Mesoscopic and submicroscopic patterning in thin polymer films: Impact of the solvent

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Keywords

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