@article{b47affe4d1ef4f3dbefde96786b2b751,
title = "Mesoscopic and submicroscopic patterning in thin polymer films: Impact of the solvent",
abstract = "Formation of mesoscopic and submicrometric self-assembled patterns in polystyrene and polycarbonate films produced by a fast dip-coating process was studied. Mixtures of chloroform and dichloromethane were used as a solvent. The mixture's composition plays a decisive role in the patterning. Close-packed honeycomb structures comprised of 200-2000 nm pores dispersed in polymer matrix were obtained. The mechanism of self-assembling is discussed.",
keywords = "Mesoscopic, Microstructure, Polymers, Pores, Self-assembling, Solvent",
author = "Edward Bormashenko and Roman Pogreb and Oleg Stanevsky and Yelena Bormashenko and Stein Tamir and Ron Cohen and Meirav Nunberg and Gaisin, {Vladimir Zeev} and Maria Gorelik and Gendelman, {O. V.}",
note = "Funding Information: This work has been supported by the Israel Ministry of Absorption. The authors are grateful to Professor M. Zinigrad for his continuous support of our research activity. Oleg Gendelman is grateful to the Taub and Shalom Foundations for financial support. We thank Mrs. N. Litvak and Mr. Al. Shulzinger for SEM imaging of the samples.",
year = "2005",
month = aug,
doi = "10.1016/j.matlet.2005.03.015",
language = "אנגלית",
volume = "59",
pages = "2461--2464",
journal = "Materials Letters",
issn = "0167-577X",
publisher = "Elsevier",
number = "19-20",
}