Investigation of metal-silicon interface influenced by Vacuum Photothermal Processing (VPP)

G. Golan, A. Chorny, L. Kranovich, A. Axelevitch

Research output: Contribution to conferencePaperpeer-review

2 Scopus citations

Abstract

Vacuum Photothermal Processing (VPP) constitutes a simultaneous irradiation of a treated sample in a vacuum chamber with electron flux and non-coherent light, mainly UV and VUV spectrum. In the present work we have studied the influence of VPP on the interface between a silicon substrate and a metal coating deposited on this substrate. It was found that the VPP provides for stabilizing the deposited coatings, improves homogeneity, and cures irreversible electrical breakdown in thin-film systems; it was also found to improve the roughness of interfaces between semiconductor and metal coatings. All of these modifications and improvements are explained by the appearance of an intermediate layer which was born up while VPP, passivaiting the interface. This built-in layer, is presented in our study.

Original languageEnglish
Pages425-428
Number of pages4
StatePublished - 2004
Externally publishedYes
EventProceedings - 2004 24th International Conference on Microelectronics, MIEL 2004 - Nis
Duration: 16 May 200419 May 2004

Conference

ConferenceProceedings - 2004 24th International Conference on Microelectronics, MIEL 2004
CityNis
Period16/05/0419/05/04

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