Influence of UV irradiation in nitrogen and air environment on dielectric properties of ultrathin polysulfone films revealed using surface plasmon resonance method

Roman Pogreb; Victor Danchuk; Gene Whyman

doi:10.1080/1023666X.2018.1501950

Influence of UV irradiation in nitrogen and air environment on dielectric properties of ultrathin polysulfone films revealed using surface plasmon resonance method

Roman Pogreb
, Victor Danchuk
, Gene Whyman

Department of Physics

Research output: Contribution to journal › Article › peer-review

Abstract

The behavior of the dielectric constant of polysulfone is investigated under various regimes of UV irradiation with wavelengths of 254 and 366 nm using in situ surface plasmon resonance method. The measurements were accomplished in air and nitrogen environments. In the nitrogen atmosphere, it was revealed the unexpected and essential increase in the dielectric permittivity of polysulfone under UV of a wavelength of 254 nm, which was ascribed to photolysis of bonds in the polymer chain followed by crosslinking. The details of kinetics of the dielectric constant under UV irradiation are discussed.

Original language	English
Pages (from-to)	669-674
Number of pages	6
Journal	International Journal of Polymer Analysis and Characterization
Volume	23
Issue number	7
DOIs	https://doi.org/10.1080/1023666X.2018.1501950
State	Published - 3 Oct 2018

Keywords

Dielectric constant
UV irradiation of polysulfone
ultrathin polymer films

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10.1080/1023666X.2018.1501950

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title = "Influence of UV irradiation in nitrogen and air environment on dielectric properties of ultrathin polysulfone films revealed using surface plasmon resonance method",

abstract = "The behavior of the dielectric constant of polysulfone is investigated under various regimes of UV irradiation with wavelengths of 254 and 366 nm using in situ surface plasmon resonance method. The measurements were accomplished in air and nitrogen environments. In the nitrogen atmosphere, it was revealed the unexpected and essential increase in the dielectric permittivity of polysulfone under UV of a wavelength of 254 nm, which was ascribed to photolysis of bonds in the polymer chain followed by crosslinking. The details of kinetics of the dielectric constant under UV irradiation are discussed.",

keywords = "Dielectric constant, UV irradiation of polysulfone, ultrathin polymer films",

author = "Roman Pogreb and Victor Danchuk and Gene Whyman",

note = "Publisher Copyright: {\textcopyright} 2018, {\textcopyright} 2018 Informa UK Limited, trading as Taylor \& Francis Group.",

year = "2018",

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doi = "10.1080/1023666X.2018.1501950",

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Influence of UV irradiation in nitrogen and air environment on dielectric properties of ultrathin polysulfone films revealed using surface plasmon resonance method. / Pogreb, Roman; Danchuk, Victor; Whyman, Gene.
In: International Journal of Polymer Analysis and Characterization, Vol. 23, No. 7, 03.10.2018, p. 669-674.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Influence of UV irradiation in nitrogen and air environment on dielectric properties of ultrathin polysulfone films revealed using surface plasmon resonance method

AU - Pogreb, Roman

AU - Danchuk, Victor

AU - Whyman, Gene

PY - 2018/10/3

Y1 - 2018/10/3

N2 - The behavior of the dielectric constant of polysulfone is investigated under various regimes of UV irradiation with wavelengths of 254 and 366 nm using in situ surface plasmon resonance method. The measurements were accomplished in air and nitrogen environments. In the nitrogen atmosphere, it was revealed the unexpected and essential increase in the dielectric permittivity of polysulfone under UV of a wavelength of 254 nm, which was ascribed to photolysis of bonds in the polymer chain followed by crosslinking. The details of kinetics of the dielectric constant under UV irradiation are discussed.

AB - The behavior of the dielectric constant of polysulfone is investigated under various regimes of UV irradiation with wavelengths of 254 and 366 nm using in situ surface plasmon resonance method. The measurements were accomplished in air and nitrogen environments. In the nitrogen atmosphere, it was revealed the unexpected and essential increase in the dielectric permittivity of polysulfone under UV of a wavelength of 254 nm, which was ascribed to photolysis of bonds in the polymer chain followed by crosslinking. The details of kinetics of the dielectric constant under UV irradiation are discussed.

KW - Dielectric constant

KW - UV irradiation of polysulfone

KW - ultrathin polymer films

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DO - 10.1080/1023666X.2018.1501950

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SN - 1023-666X

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JO - International Journal of Polymer Analysis and Characterization

JF - International Journal of Polymer Analysis and Characterization

IS - 7

ER -

Influence of UV irradiation in nitrogen and air environment on dielectric properties of ultrathin polysulfone films revealed using surface plasmon resonance method

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