Hot-Probe method for evaluation of impurities concentration in semiconductors

G. Golan, A. Axelevitch, B. Gorenstein, V. Manevych

Research output: Contribution to journalArticlepeer-review

114 Scopus citations


Electrical, optical, and mechanical properties of thin films significantly differ from those of bulk materials. Therefore, characterization methods for evaluation of thin film properties became highly important. A novel approach to the well known "Hot-Probe" method is proposed and applied in our work. The conventional Hot Probe characterization method enables only the definition of a semiconductor type, P or N, by identifying the majority charged carriers. According to the new Hot Probe technique, one can measure and calculate the majority charged carriers concentration and its dynamic parameters. Feasibility proof of the upgraded Hot Probe method was done in Si and Ge bulk, and in thin film semiconductor samples.

Original languageEnglish
Pages (from-to)910-915
Number of pages6
JournalMicroelectronics Journal
Issue number9
StatePublished - Sep 2006
Externally publishedYes


  • Charged carriers concentration
  • Hot-Probe method
  • Semiconductors film properties
  • Type of charged carriers


Dive into the research topics of 'Hot-Probe method for evaluation of impurities concentration in semiconductors'. Together they form a unique fingerprint.

Cite this