A linear model application for the design of transparent conductive In₂O₃ coatings

Keyphrases

• Transparent Conductive Materials 100%
• In2O3 Coating 100%
• Indium Oxide 66%
• Sputtering Process 66%
• Resistivity 33%
• Film Thickness 33%
• High Purity Indium 33%
• Glass Substrate 33%
• Argon Atmosphere 33%
• Oxide Targets 33%
• Indium Oxide Thin Films 33%
• DC Magnetron Sputtering 33%
• Process Optimization 33%
• Process Independent 33%
• Substrate Temperature 33%
• High Transparency 33%
• Active Factor 33%
• Target Voltage 33%
• Factor Space Theory 33%
• Optimal Process Parameters 33%
• In2O3 Thin Film 33%
• Linear Programming Method 33%
• Argon Pressure 33%
• Production Design 33%
• Model Calculation 33%

Material Science

• Oxide Compound 100%
• Thin Films 100%
• Indium 100%
• Electrical Resistivity 33%
• Film Thickness 33%
• Magnetron Sputtering 33%

Chemical Engineering

• Film 100%
• Indium 75%
• Magnetron Sputtering 25%