ملخص
A practical and theoretical investigation into a method for estimating the forms and dimensions of etching zones on magnetron sputtering targets is presented. This estimation is based on detailed geometry considerations of the internal arrangement of the vacuum chamber and the sputtering parameters. It is proved theoretically and experimentally that etching zones on sputtering targets are in a ring shape and that their location and dimensions are independent on the target material or dimensions.
| اللغة الأصلية | الإنجليزيّة |
|---|---|
| الصفحات (من إلى) | 72-77 |
| عدد الصفحات | 6 |
| دورية | Thin Solid Films |
| مستوى الصوت | 300 |
| رقم الإصدار | 1-2 |
| المعرِّفات الرقمية للأشياء | |
| حالة النشر | نُشِر - 28 مايو 1997 |
| منشور خارجيًا | نعم |