Novel type of indium oxide thin films sputtering for opto-electronic applications

G. Golan, A. Axelevitch, B. Gorenstein, A. Peled

نتاج البحث: نشر في مجلةمقالةمراجعة النظراء

40 اقتباسات (Scopus)

ملخص

Transparent conductive oxide (TCO) thin films play a significant role in recent optical technologies. Displays of various types, photovoltaic systems, and opto-electronic devices use these films as transparent signal electrodes. They are used as heating surfaces and active control layers. Oxides of TCO materials such as: tin, indium, zinc, cadmium, titanium and the like, exhibit their properties. However, indium oxide and indium oxide doped with tin (ITO) coatings are the most used in this technology. In this work, we present conductive transparent indium oxide thin films which were prepared using a novel triode sputtering method. A pure In 2 O 3 target of 2 in. in diameter was used in a laboratory triode sputtering system. This system provided plane plasma discharge at a relatively low pressure 0.5-5 mTorr of pure argon. The substrate temperature was varied during the experiments from room temperature up to 200 °C. The films were deposited on glass, silicon, and flexible polyimide substrates. The films were characterized for optical and electrical properties and compared with the indium oxide films deposited by magnetron sputtering.

اللغة الأصليةالإنجليزيّة
الصفحات (من إلى)6608-6611
عدد الصفحات4
دوريةApplied Surface Science
مستوى الصوت253
رقم الإصدار15
المعرِّفات الرقمية للأشياء
حالة النشرنُشِر - 30 مايو 2007
منشور خارجيًانعم

بصمة

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