TY - GEN
T1 - Investigation of Optical Transmission in Thin Metal Films
AU - Axelevitch, A.
AU - Gorenstein, B.
AU - Golan, G.
N1 - Publisher Copyright:
© 2012 Published by Elsevier B.V.
PY - 2012
Y1 - 2012
N2 - Thin metal films have recently attracted large interest due to their practical application in photo-detectors, solar cells and quantum electronics. It is known that thin films of noble metals such as Au, Ag, and Cu have a maximum optical transmittance in the shorter part of spectrum. In our work, optical properties of thin metals films deposited by thermal evaporation and low pressure (1.33·10-5- 1.33·10-4 Pa) DC plasma sputtering were investigated. Such low pressure is provided by triode sputtering method which supports a ballistic type of mass transfer between the sputtering target and the substrate. This method enables fine control of the film thickness and its density. Comparison of the films deposited by mentioned above two methods on glass substrates shows significant differences in their optical and electrical properties. Thin films of following metals: Sn, Al, V, Ti, Ni, Mo, Ta, W, Au, Ag, and Cu were deposited on glass and their optical and electrical properties were studied. The transmission spectra of thin films of various metals have significant differences. In our paper we discuss the causes of these differences.
AB - Thin metal films have recently attracted large interest due to their practical application in photo-detectors, solar cells and quantum electronics. It is known that thin films of noble metals such as Au, Ag, and Cu have a maximum optical transmittance in the shorter part of spectrum. In our work, optical properties of thin metals films deposited by thermal evaporation and low pressure (1.33·10-5- 1.33·10-4 Pa) DC plasma sputtering were investigated. Such low pressure is provided by triode sputtering method which supports a ballistic type of mass transfer between the sputtering target and the substrate. This method enables fine control of the film thickness and its density. Comparison of the films deposited by mentioned above two methods on glass substrates shows significant differences in their optical and electrical properties. Thin films of following metals: Sn, Al, V, Ti, Ni, Mo, Ta, W, Au, Ag, and Cu were deposited on glass and their optical and electrical properties were studied. The transmission spectra of thin films of various metals have significant differences. In our paper we discuss the causes of these differences.
KW - Low-Pressure Sputtering
KW - Metal thin films
KW - Optical properties
UR - http://www.scopus.com/inward/record.url?scp=85015072072&partnerID=8YFLogxK
U2 - 10.1016/j.phpro.2012.03.510
DO - 10.1016/j.phpro.2012.03.510
M3 - ???researchoutput.researchoutputtypes.contributiontobookanthology.conference???
AN - SCOPUS:85015072072
T3 - Physics Procedia
SP - 1
EP - 13
BT - 18th International Vacuum Congress, IVC 2010
A2 - Pan, Feng
A2 - Chen, Xu
T2 - 18th International Vacuum Congress, IVC 2010
Y2 - 23 August 2010 through 27 August 2010
ER -