TY - JOUR
T1 - Calibration of volume charge measurements by use of electron beam implantation
AU - Cooke, C. M.
AU - Wright, K. A.
AU - Takasu, N.
AU - Bernstein, J. B.
AU - Gollin, E.
PY - 1989/10
Y1 - 1989/10
N2 - The authors consider the use of charges implanted by means of energetic electron beams to create known charge distributions for calibration purposes. For a successful calibration the reference charge samples should provide a well-defined charge, including location, distribution, and magnitude (and sign). Although these parts of the calibration may be accomplished with different samples, it is preferable for simplicity and accuracy to include these in a single sample. The e-beam implanted charge distributions have been found to achieve the needed reference charge characteristics. Specifically, it was demonstrated that e-beam implantation of charges in charge-retaining plastics, such as PMMA (polymethyl methacrylate), provides a useful reference for the purpose of calibrating charge measurement instruments.
AB - The authors consider the use of charges implanted by means of energetic electron beams to create known charge distributions for calibration purposes. For a successful calibration the reference charge samples should provide a well-defined charge, including location, distribution, and magnitude (and sign). Although these parts of the calibration may be accomplished with different samples, it is preferable for simplicity and accuracy to include these in a single sample. The e-beam implanted charge distributions have been found to achieve the needed reference charge characteristics. Specifically, it was demonstrated that e-beam implantation of charges in charge-retaining plastics, such as PMMA (polymethyl methacrylate), provides a useful reference for the purpose of calibrating charge measurement instruments.
UR - http://www.scopus.com/inward/record.url?scp=0024750820&partnerID=8YFLogxK
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AN - SCOPUS:0024750820
SN - 0084-9162
SP - 435
EP - 441
JO - Conference on Electrical Insulation and Dielectric Phenomena (CEIDP), Annual Report
JF - Conference on Electrical Insulation and Dielectric Phenomena (CEIDP), Annual Report
T2 - IEEE 1989 Annual Report: Conference on Electrical Insulation and Dielectric Phenomena
Y2 - 29 October 1989 through 1 November 1989
ER -